A corrosion retarding polishing slurry for the chemical mechanical polishing of copper surfaces
A Standard patent application filed on 14 October 2003 credited to Obeng, Yaw S.
Details
Application number :
2003282852
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
A corrosion retarding polishing slurry for the chemical mechanical polishing of copper surfaces