Projection optical system, exposure device, and exposure method

Application number :: 2002344559
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Projection optical system, exposure device, and exposure method
Inventor :: Ikezawa, Hironori ; Omura, Yasuhiro ; Ozawa, Toshihiko
Agent name :
Address for service :
Filing date :: 22 October 2002
Associated companies :
Applicant name :: NIKON CORPORATION
Applicant address :: 2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331
Old name :
Original Source :: Go

Projection optical system, exposure device, and exposure method A Standard patent application filed on 22 October 2002 credited to Ikezawa, Hironori ; Omura, Yasuhiro ; Ozawa, Toshihiko