Diaphragm device, projection optical system and projection exposure device, and micro-device producing method
A Standard patent application filed on 26 September 2002 credited to Tamaoki, Kenji
Details
Application number :
2002335432
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Diaphragm device, projection optical system and projection exposure device, and micro-device producing method
Inventor :
Tamaoki, Kenji
Agent name :
Address for service :
Filing date :
26 September 2002
Associated companies :
Applicant name :
NIKON CORPORATION
Applicant address :
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331