Fizeau lens, interference measuring device, interference measuring method, method of manufacturing projective optical system, and projective exposure device
A Standard patent application filed on 31 March 2003 credited to Gemma, Takashi
Details
Application number :
2003221011
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Fizeau lens, interference measuring device, interference measuring method, method of manufacturing projective optical system, and projective exposure device
Inventor :
Gemma, Takashi
Agent name :
Address for service :
Filing date :
31 March 2003
Associated companies :
Applicant name :
NIKON CORPORATION
Applicant address :
2-3, Marunouchi 3-Chome, Chiyoda-ku, Tokyo 100-8331