Details

Application number :
2003211559  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method  
Inventor :
Higashi, Kenji ; Nakashima, Toshiharu ; Hirukawa, Shigeru  
Agent name :
 
Address for service :
 
Filing date :
28 February 2003  
Associated companies :
 
Applicant name :
NIKON CORPORATION  
Applicant address :
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331  
Old name :
 
Original Source :
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