Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method
A Standard patent application filed on 28 February 2003 credited to Higashi, Kenji ; Nakashima, Toshiharu ; Hirukawa, Shigeru

Details

Application number :

2003211559  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method  

Inventor :

Higashi, Kenji ; Nakashima, Toshiharu ; Hirukawa, Shigeru  

Agent name :

 

Address for service :

 

Filing date :

28 February 2003  

Associated companies :

 

Applicant name :

NIKON CORPORATION  

Applicant address :

2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331  

Old name :

 

Original Source :

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