Apparatus and process for the abatement of semiconductor manufacturing effluentscontaining fluorine gas
A Standard patent application filed on 09 April 2001 credited to Arno, Jose I.

Details

Application number :
2001256997  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Apparatus and process for the abatement of semiconductor manufacturing effluentscontaining fluorine gas  
Inventor :
Arno, Jose I.  
Agent name :
 
Address for service :
 
Filing date :
09 April 2001  
Associated companies :
 
Applicant name :
Advanced Technology Materials, Inc.  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor