Atmospheric pressure plasma enhanced abatement of semiconductor process effluent species
A Standard patent application filed on 07 February 2002 credited to Arno, Jose I.

Details

Application number :
2002306554  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Atmospheric pressure plasma enhanced abatement of semiconductor process effluent species  
Inventor :
Arno, Jose I.  
Agent name :
 
Address for service :
 
Filing date :
07 February 2002  
Associated companies :
 
Applicant name :
ADVANCED TECHNOLOGY MATERIALS, INC.  
Applicant address :
7 Commerce Drive, Danbury, CT 06810  
Old name :
 
Original Source :
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Same Inventor