Details

Application number :
2003270859  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (xfn) compounds for use in cleaning semiconductor processing chambers  
Inventor :
Olander, W. Karl ; Arno, Jose I.  
Agent name :
 
Address for service :
 
Filing date :
23 September 2003  
Associated companies :
 
Applicant name :
ADVANCED TECHNOLOGY MATERIALS, INC.  
Applicant address :
William F. Ryann, 7 Commerce Drive, Danbury, CT 06810  
Old name :
 
Original Source :
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