System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (xfn) compounds for use in cleaning semiconductor processing chambers
A Standard patent application filed on 23 September 2003 credited to Olander, W. Karl
;
Arno, Jose I.
Details
Application number :
2003270859
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
System for in-situ generation of fluorine radicals and/or fluorine-containing interhalogen (xfn) compounds for use in cleaning semiconductor processing chambers
Inventor :
Olander, W. Karl
;
Arno, Jose I.
Agent name :
Address for service :
Filing date :
23 September 2003
Associated companies :
Applicant name :
ADVANCED TECHNOLOGY MATERIALS, INC.
Applicant address :
William F. Ryann, 7 Commerce Drive, Danbury, CT 06810