Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
A Standard patent application filed on 03 May 2000 credited to Arno, Jose I.

Details

Application number :
48171  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases  
Inventor :
Arno, Jose I.  
Agent name :
 
Address for service :
 
Filing date :
03 May 2000  
Associated companies :
 
Applicant name :
Advanced Technology Materials, Inc.  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor