Plasma chemical vapor deposition apparatus
A Standard patent application filed on 18 January 1999 credited to Murata, Masayoshi ; Takeuchi, Yoshiaki ; Yoshida, Hirohisa ; Takano, Akemi ; Mashima, Hiroshi

Details

Application number :
12141  
Application type :
Standard  
Application status :
SEALED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Plasma chemical vapor deposition apparatus  
Inventor :
Murata, Masayoshi ; Takeuchi, Yoshiaki ; Yoshida, Hirohisa ; Takano, Akemi ; Mashima, Hiroshi  
Agent name :
Davies Collison Cave  
Address for service :
Level 15 1 Nicholson Street MELBOURNE VIC 3000  
Filing date :
18 January 1999  
Associated companies :
 
Applicant name :
Mitsubishi Heavy Industries Limited  
Applicant address :
5-1 Marunouchi 2-chome Chiyoda-ku Tokyo Japan  
Old name :
 
Original Source :
Go  

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