Plasma chemical vapor deposition methods and apparatus

Application number :: 2002340316
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Plasma chemical vapor deposition methods and apparatus
Inventor :: Lane, Barton G. Iii ; Khanna, Samir ; Mazumder, Prantik ; House, Keith L.
Agent name :
Address for service :
Filing date :: 28 October 2002
Associated companies :
Applicant name :: CORNING INCORPORATED
Applicant address :: 1 Riverfront Plaza, Corning, NY 14831
Old name :
Original Source :: Go

Plasma chemical vapor deposition methods and apparatus A Standard patent application filed on 28 October 2002 credited to Lane, Barton G. Iii ; Khanna, Samir ; Mazumder, Prantik ; House, Keith L.