Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus
A Standard patent application filed on 29 October 2002 credited to Takano, Akemi ; Sasakawa, Eishiro ; Takatuka, Hiromu ; Takeuchi, Yoshiaki ; Kawamura, Keisuke ; Yamauti, Yasuhiro ; Mashima, Hiroshi

Details

Application number :

2002344594  

Application type :

Standard  

Application status :

SEALED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus  

Inventor :

Takano, Akemi ; Sasakawa, Eishiro ; Takatuka, Hiromu ; Takeuchi, Yoshiaki ; Kawamura, Keisuke ; Yamauti, Yasuhiro ; Mashima, Hiroshi  

Agent name :

Davies Collison Cave  

Address for service :

1 Nicholson Street Melbourne VIC 3000 Australia  

Filing date :

29 October 2002  

Associated companies :

 

Applicant name :

Mitsubishi Heavy Industries, Ltd.  

Applicant address :

5-1, Marunouchi 2-chome Chiyoda-ku Tokyo 100-8315 Japan  

Old name :

 

Original Source :

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