Apparatus and method for high density plasma chemical vapor deposition
A Standard patent application filed on 02 June 1997 credited to Mcmillin, Brian ; Berney, Butch ; Barnes, Michael ; Nguyen, Huong

Details

Application number :

31451  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Apparatus and method for high density plasma chemical vapor deposition  

Inventor :

Mcmillin, Brian ; Berney, Butch ; Barnes, Michael ; Nguyen, Huong  

Agent name :

 

Address for service :

 

Filing date :

02 June 1997  

Associated companies :

 

Applicant name :

Lam Research Corporation  

Applicant address :

 

Old name :

 

Original Source :

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