Photosensitive resin composition and photosensitive element using the resin composition
A Standard patent application filed on 15 October 1998 credited to Murakami, Shigeru
;
Kosaka, Eiji
Details
Application number :
89314
Application type :
Standard
Application status :
CEASED
Under opposition :
No
Proceeding type :
Invention title :
Photosensitive resin composition and photosensitive element using the resin composition
Inventor :
Murakami, Shigeru
;
Kosaka, Eiji
Agent name :
PHILLIPS ORMONDE FITZPATRICK
Address for service :
367 Collins Street MELBOURNE VIC 3000
Filing date :
15 October 1998
Associated companies :
Applicant name :
Nichigo Morton Co., Ltd.
Applicant address :
Nittobo Building 8-1 Yaesu 2-chome Chuo-ku Tokyo 104 Japan