Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon
A Standard patent application filed on 23 October 2000 credited to Satou, Kuniaki ; Kutsuna, Takahiko ; Uzawa, Mikio ; Hirayama, Takao ; Yoshino, Toshizumi

Details

Application number :

79544  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, resist pattern and substrate having the resist pattern laminated thereon  

Inventor :

Satou, Kuniaki ; Kutsuna, Takahiko ; Uzawa, Mikio ; Hirayama, Takao ; Yoshino, Toshizumi  

Agent name :

 

Address for service :

 

Filing date :

23 October 2000  

Associated companies :

 

Applicant name :

Hitachi Chemical Co. Ltd.  

Applicant address :

 

Old name :

 

Original Source :

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