Photosensitive resin composition and photosensitive element using the same

Application number :: 2003281404
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Photosensitive resin composition and photosensitive element using the same
Inventor :: Nakano, Akio ; Tsuchiya, Katsunori ; Miyoshi, Hiroko
Agent name :
Address for service :
Filing date :: 04 July 2003
Associated companies :
Applicant name :: HITACHI CHEMICAL CO., LTD.
Applicant address :: 1-1, Nishi-Shinjuku 2-chome, Shinjuku-ku, Tokyo 163-0449
Old name :
Original Source :: Go

Photosensitive resin composition and photosensitive element using the same A Standard patent application filed on 04 July 2003 credited to Nakano, Akio ; Tsuchiya, Katsunori ; Miyoshi, Hiroko