Low contamination high density plasma etch chambers and methods for making the same
A Standard patent application filed on 24 September 1999 credited to Wicker, Thomas E. ; Kennedy, William S. ; Maraschin, Robert A.

Details

Application number :
14401  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Low contamination high density plasma etch chambers and methods for making the same  
Inventor :
Wicker, Thomas E. ; Kennedy, William S. ; Maraschin, Robert A.  
Agent name :
 
Address for service :
 
Filing date :
24 September 1999  
Associated companies :
 
Applicant name :
Lam Research Corporation  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor