Fluorinated polymers, photoresists and processes for microlithography

Application number :: 46781
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Fluorinated polymers, photoresists and processes for microlithography
Inventor :: Feldman, Jerald ; Feiring, Andrew Edward
Agent name :
Address for service :
Filing date :: 28 April 2000
Associated companies :
Applicant name :: E.I. Du Pont De Nemours and Company
Applicant address :
Old name :
Original Source :: Go

Fluorinated polymers, photoresists and processes for microlithography A Standard patent application filed on 28 April 2000 credited to Feldman, Jerald ; Feiring, Andrew Edward