Fluorinated polymers, photoresists and processes for microlithography

Application number :: 2003254112
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Fluorinated polymers, photoresists and processes for microlithography
Inventor :: Feiring, Andrew Edward ; Ogata, Toshiyuki ; Endo, Koutaro ; Schadt, Frank Leonard Iii
Agent name :
Address for service :
Filing date :: 23 July 2003
Associated companies :
Applicant name :: E. I. DU PONT DE NEMOURS AND COMPANY
Applicant address :: 1007 Market Street, Wilmington, DE 19898
Old name :
Original Source :: Go

Fluorinated polymers, photoresists and processes for microlithography A Standard patent application filed on 23 July 2003 credited to Feiring, Andrew Edward ; Ogata, Toshiyuki ; Endo, Koutaro ; Schadt, Frank Leonard Iii