Fluorinated polymers useful as photoresists, and processes for microlithography
A Standard patent application filed on 19 August 2003 credited to Feiring, Andrew Edward ; Farnham, William Brown ; Feldman, Jerald ; Schadt, Frank L. Iii

Details

Application number :
2003259951  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Fluorinated polymers useful as photoresists, and processes for microlithography  
Inventor :
Feiring, Andrew Edward ; Farnham, William Brown ; Feldman, Jerald ; Schadt, Frank L. Iii  
Agent name :
 
Address for service :
 
Filing date :
19 August 2003  
Associated companies :
 
Applicant name :
E.I. DU PONT DE NEMOURS AND COMPANY  
Applicant address :
1007 Market Street, Wilmington, DE 19898  
Old name :
 
Original Source :
Go  

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