Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
A Standard patent application filed on 08 August 2003 credited to Feiring, Andrew E.
;
Smart, Bruce Edmund
;
Farnham, William Brown
;
Petrov, Viacheslav Alexandrovich
;
Schadt, Frank L. Iii
Details
Application number :
2003259728
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
Inventor :
Feiring, Andrew E.
;
Smart, Bruce Edmund
;
Farnham, William Brown
;
Petrov, Viacheslav Alexandrovich
;
Schadt, Frank L. Iii