Method for forming insulating film on substrate, method for manufacturing semiconductor device and substrate-processing apparatus
A Standard patent application filed on 19 September 2003 credited to Shinriki, Hiroshi ; Aoyama, Shintaro ; Igeta, Masanobu

Details

Application number :
2003264511  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method for forming insulating film on substrate, method for manufacturing semiconductor device and substrate-processing apparatus  
Inventor :
Shinriki, Hiroshi ; Aoyama, Shintaro ; Igeta, Masanobu  
Agent name :
 
Address for service :
 
Filing date :
19 September 2003  
Associated companies :
 
Applicant name :
TOKYO ELECTRON LIMITED  
Applicant address :
3-6, Akasaka 5-Chome, Minato-Ku, Tokyo 107-8481  
Old name :
 
Original Source :
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Same Inventor