Method of treating substrate and process for producing semiconductor device
A Standard patent application filed on 21 April 2003 credited to Shinriki, Hiroshi ; Aoyama, Shintaro ; Igeta, Masanobu

Details

Application number :
2003235305  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Method of treating substrate and process for producing semiconductor device  
Inventor :
Shinriki, Hiroshi ; Aoyama, Shintaro ; Igeta, Masanobu  
Agent name :
 
Address for service :
 
Filing date :
21 April 2003  
Associated companies :
 
Applicant name :
TOKYO ELECTRON LIMITED  
Applicant address :
3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  
Old name :
 
Original Source :
Go  

Same Inventor