Method and device for processing substrate, and apparatus for manufacturing semiconductor device

Application number :: 2002362188
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Method and device for processing substrate, and apparatus for manufacturing semiconductor device
Inventor :: Shinriki, Hiroshi ; Takahashi, Tsuyoshi ; Aoyama, Shintaro ; Igeta, Masanobu
Agent name :
Address for service :
Filing date :: 27 December 2002
Associated companies :
Applicant name :: TOKYO ELECTRON LIMITED
Applicant address :: 3-6, Akasaka 5-Chome, Minato-Ku, Tokyo 107-8481
Old name :
Original Source :: Go

Method and device for processing substrate, and apparatus for manufacturing semiconductor device A Standard patent application filed on 27 December 2002 credited to Shinriki, Hiroshi ; Takahashi, Tsuyoshi ; Aoyama, Shintaro ; Igeta, Masanobu