Plasma processing device and controlling method therefor
A Standard patent application filed on 24 July 2003 credited to Ishii, Nobuo ; Shinohara, Kibatsu

Details

Application number :
2003252258  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Plasma processing device and controlling method therefor  
Inventor :
Ishii, Nobuo ; Shinohara, Kibatsu  
Agent name :
 
Address for service :
 
Filing date :
24 July 2003  
Associated companies :
 
Applicant name :
TOKYO ELECTRON LIMITED  
Applicant address :
3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  
Old name :
 
Original Source :
Go  

Same Inventor