A silicon-on-insulator device with strained device film and method for making the same with partial replacement of isolation oxide
A Standard patent application filed on 04 June 2003 credited to Maszara, Witold P.
Details
Application number :
2003238916
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
A silicon-on-insulator device with strained device film and method for making the same with partial replacement of isolation oxide
Inventor :
Maszara, Witold P.
Agent name :
Address for service :
Filing date :
04 June 2003
Associated companies :
Applicant name :
ADVANCED MICRO DEVICES, INC.
Applicant address :
One AMD Place, Mail Stop 68, P.O. Box 3453, Sunnyvale, CA 94088-3453