Asymmetric semiconductor device having dual work function gate and method of fabrication
A Standard patent application filed on 23 December 2002 credited to Wang, Haihong ; Maszara, Witold P. ; Xiang, Qi

Details

Application number :

2002361895  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Asymmetric semiconductor device having dual work function gate and method of fabrication  

Inventor :

Wang, Haihong ; Maszara, Witold P. ; Xiang, Qi  

Agent name :

 

Address for service :

 

Filing date :

23 December 2002  

Associated companies :

 

Applicant name :

ADVANCED MICRO DEVICES, INC.  

Applicant address :

One AMD Place, P.O. Box 3453, Mail Stop 68, Sunnyvale, CA 94088-3453  

Old name :

 

Original Source :

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