Metal gate electrode using silicidation and method of formation thereof
A Standard patent application filed on 28 April 2003 credited to Krivokapic, Zoran ; Maszara, Witold P.

Details

Application number :

2003231119  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Metal gate electrode using silicidation and method of formation thereof  

Inventor :

Krivokapic, Zoran ; Maszara, Witold P.  

Agent name :

 

Address for service :

 

Filing date :

28 April 2003  

Associated companies :

 

Applicant name :

ADVANCED MICRO DEVICES, INC  

Applicant address :

One AMD Place, Mail Stop 68, P.O.Box 3453, Sunnyvale, CA 94088-3453  

Old name :

 

Original Source :

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