Details

Application number :
2002367178  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Etching method and plasma etching device  
Inventor :
Higuchi, Fumihiko ; Horiguchi, Katsumi ; Matsumoto, Takanori ; Shimonishi, Satoshi ; Yamamoto, Kenji  
Agent name :
 
Address for service :
 
Filing date :
25 December 2002  
Associated companies :
 
Applicant name :
KABUSHIKI KAISHA TOSHIBA  
Applicant address :
1-1, Shibaura 1-chome, Minato-ku, Tokyo, Tokyo 105-0023  
Old name :
 
Original Source :
Go  

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