Details
- Application number :
- 2002349419
- Application type :
- Standard
- Application status :
- LAPSED
- Under opposition :
- No
- Proceeding type :
-
- Invention title :
- Plasma etching method and plasma etching device
- Inventor :
- Hayashi, Hisataka
;
Nagaseki, Kazuya
;
Matsuyama, Shoichiro
;
Honda, Masanobu
;
Inazawa, Koichiro
- Agent name :
-
- Address for service :
-
- Filing date :
- 04 December 2002
- Associated companies :
-
- Applicant name :
- KABUSHIKI KAISHA TOSHIBA
- Applicant address :
- 1-1, Shibaura 1-chome, Minato-ku, Tokyo 105-8001
- Old name :
-
- Original Source :
- Go