Details
- Application number :
- 2003292678
- Application type :
- Standard
- Application status :
- LAPSED
- Under opposition :
- No
- Proceeding type :
-
- Invention title :
- Plasma generator, ozone generator, substrate processing apparatus, and method for manufacturing semiconductor device
- Inventor :
- Mase, Hiroshi
;
Sato, Noriyoshi
;
Fujiwara, Tamiya
;
Taniguchi, Takeshi
;
Fujii, Shuitsu
- Agent name :
-
- Address for service :
-
- Filing date :
- 26 December 2003
- Associated companies :
-
- Applicant name :
- FUJIWARA, Tamiya
- Applicant address :
- 16-2, Nishi-Aoyama 2-chome, Morioka-shi, Iwate 020-0132
- Old name :
-
- Original Source :
- Go