Plasma process apparatus
A Standard patent application filed on 13 December 2002 credited to Iwama, Nobuhiro ; Higashiura, Tsutomu ; Akahori, Takashi ; Kawakami, Satoru

Details

Application number :
2002358315  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Plasma process apparatus  
Inventor :
Iwama, Nobuhiro ; Higashiura, Tsutomu ; Akahori, Takashi ; Kawakami, Satoru  
Agent name :
 
Address for service :
 
Filing date :
13 December 2002  
Associated companies :
 
Applicant name :
TOKOYO ELECTRON LIMITED  
Applicant address :
3-6, Akasaka 5-chome, Minato-ku, Toyoko 107-8481  
Old name :
 
Original Source :
Go  

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