Plasma processing apparatus and plasma processing method
A Standard patent application filed on 20 November 2003 credited to Ozaki, Shigenori ; Nakanishi, Toshio ; Nishita, Tatsuo

Details

Application number :
2003284598  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Plasma processing apparatus and plasma processing method  
Inventor :
Ozaki, Shigenori ; Nakanishi, Toshio ; Nishita, Tatsuo  
Agent name :
 
Address for service :
 
Filing date :
20 November 2003  
Associated companies :
 
Applicant name :
TOKYO ELECTRON LIMITED  
Applicant address :
3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  
Old name :
 
Original Source :
Go  

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