Plasma processing apparatus, processing vessel used in plasma processing apparatus, dielectric plate used in plasma processing apparatus
A Standard patent application filed on 10 October 2003 credited to Morita, Osamu

Details

Application number :
2003272975  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Plasma processing apparatus, processing vessel used in plasma processing apparatus, dielectric plate used in plasma processing apparatus  
Inventor :
Morita, Osamu  
Agent name :
 
Address for service :
 
Filing date :
10 October 2003  
Associated companies :
 
Applicant name :
TOKYO ELECTRON LIMITED  
Applicant address :
3-6, Akasaka 5-chome, Minato-ku, Tokyo 107-8481  
Old name :
 
Original Source :
Go  

Same Inventor