Chemical vapor deposition system

Application number :: 2002343583
Application type :: Standard
Application status :: LAPSED
Under opposition :: No
Proceeding type :
Invention title :: Chemical vapor deposition system
Inventor :: Jansz, Adrian ; Seidel, Thomas E. ; Doering, Ken ; Puchacz, Jurek
Agent name :
Address for service :
Filing date :: 29 October 2002
Associated companies :
Applicant name :: GENUS, INC.
Applicant address :: 1139 Karlstad Drive, Sunnyvale, CA 94089
Old name :
Original Source :: Go

Chemical vapor deposition system A Standard patent application filed on 29 October 2002 credited to Jansz, Adrian ; Seidel, Thomas E. ; Doering, Ken ; Puchacz, Jurek