Chemical vapor deposition system and method
A Standard patent application filed on 03 March 2000 credited to Bailey, Robert J. ; Kane, Thomas E. ; Michael, Lisa H.

Details

Application number :

33944  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Chemical vapor deposition system and method  

Inventor :

Bailey, Robert J. ; Kane, Thomas E. ; Michael, Lisa H.  

Agent name :

 

Address for service :

 

Filing date :

03 March 2000  

Associated companies :

 

Applicant name :

Silicon Valley Group Thermal Systems, LLC  

Applicant address :

 

Old name :

 

Original Source :

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