Chemical vapor deposition system
A Standard patent application filed on 07 August 2002 credited to Faykosh, Gary T.
;
Hinkle, James E.
;
Foote, James B.
Details
Application number :
2002332470
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Chemical vapor deposition system
Inventor :
Faykosh, Gary T.
;
Hinkle, James E.
;
Foote, James B.