Automatic valve control system in plasma chemical vapor deposition system and chemical vapor deposition system for deposition of nano-scale multilayer film
A Standard patent application filed on 07 April 2003 credited to Lim, Ju Wan ; Lee, Seung Hoon ; Lee, Jung Joong

Details

Application number :

2003235486  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Automatic valve control system in plasma chemical vapor deposition system and chemical vapor deposition system for deposition of nano-scale multilayer film  

Inventor :

Lim, Ju Wan ; Lee, Seung Hoon ; Lee, Jung Joong  

Agent name :

 

Address for service :

 

Filing date :

07 April 2003  

Associated companies :

 

Applicant name :

LEE, Jung Joong  

Applicant address :

Wooseong Apt. 301-1510, Shinjeong-dong, Yangcheon-ku, Seoul 158-070  

Old name :

 

Original Source :

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