Method and apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
A Standard patent application filed on 01 June 1995 credited to Foster, Robert F ; Arena, Chantal ; Faguet, Jacques ; Hillman, Joseph T

Details

Application number :

27640  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Method and apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor  

Inventor :

Foster, Robert F ; Arena, Chantal ; Faguet, Jacques ; Hillman, Joseph T  

Agent name :

 

Address for service :

 

Filing date :

01 June 1995  

Associated companies :

 

Applicant name :

Materials Research Corporation  

Applicant address :

 

Old name :

 

Original Source :

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