Optical system and exposure system provided with the optical system
A Standard patent application filed on 19 June 2002 credited to Omura, Yasuhiro
;
Shiraishi, Naomasa
Details
Application number :
2002311268
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Optical system and exposure system provided with the optical system
Inventor :
Omura, Yasuhiro
;
Shiraishi, Naomasa
Agent name :
Address for service :
Filing date :
19 June 2002
Associated companies :
Applicant name :
NIKON CORPORATION
Applicant address :
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331