Aberration measuring device, aberration measuring method, regulation method for optical system, and exposure system provided with optical system regulated by the regulation method
A Standard patent application filed on 24 September 2002 credited to Shiraishi, Naomasa
Details
Application number :
2002344054
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Aberration measuring device, aberration measuring method, regulation method for optical system, and exposure system provided with optical system regulated by the regulation method
Inventor :
Shiraishi, Naomasa
Agent name :
Address for service :
Filing date :
24 September 2002
Associated companies :
Applicant name :
NIKON CORPORATION
Applicant address :
2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 100-8331