Precursors for making low dielectric constant materials with improved thermal stability
A Standard patent application filed on 15 October 1998 credited to Lee, Chung J
;
Foggiato, Giovanni Antonio
;
Wang, Hui
Details
Application number :
10920
Application type :
Standard
Application status :
LAPSED
Under opposition :
No
Proceeding type :
Invention title :
Precursors for making low dielectric constant materials with improved thermal stability
Inventor :
Lee, Chung J
;
Foggiato, Giovanni Antonio
;
Wang, Hui