Low dielectric constant materials prepared from photon or plasma assisted cvd
A Standard patent application filed on 15 October 1998 credited to Lee, Chung J ; Wang, Hui ; Foggiato, Giovanni Antonio

Details

Application number :
10879  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Low dielectric constant materials prepared from photon or plasma assisted cvd  
Inventor :
Lee, Chung J ; Wang, Hui ; Foggiato, Giovanni Antonio  
Agent name :
 
Address for service :
 
Filing date :
15 October 1998  
Associated companies :
 
Applicant name :
Quester Technology, Inc.  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor