Particulate contamination removal from wafers using plasmas and mechanical agit ation
A Standard patent application filed on 12 March 1997 credited to Selwyn, Gary S.

Details

Application number :

20775  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Particulate contamination removal from wafers using plasmas and mechanical agit ation  

Inventor :

Selwyn, Gary S.  

Agent name :

 

Address for service :

 

Filing date :

12 March 1997  

Associated companies :

 

Applicant name :

Regents of the University of California, The  

Applicant address :

 

Old name :

 

Original Source :

Go  

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