Atmospheric pressure plasma etching reactor
A Standard patent application filed on 12 March 2002 credited to Selwyn, Gary S. ; Henins, Ivars ; Snyder, Hans

Details

Application number :

2002250287  

Application type :

Standard  

Application status :

LAPSED  

Under opposition :

No  

Proceeding type :

 

Invention title :

Atmospheric pressure plasma etching reactor  

Inventor :

Selwyn, Gary S. ; Henins, Ivars ; Snyder, Hans  

Agent name :

 

Address for service :

 

Filing date :

12 March 2002  

Associated companies :

 

Applicant name :

THE REGENTS OF THE UNIVERSITY OF CALIFORNIA  

Applicant address :

Los Alamos National Laboratory, LC/IP, MS A187, Los Alamos, NM 87545  

Old name :

 

Original Source :

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Same Inventor

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