Photosensitive resin composition
A Standard patent application filed on 30 October 1996 credited to Nishikawa, Katsue ; Hagiwara, Youshichi ; Chiba, Reiko ; Kinashi, Keiichi

Details

Application number :
73383  
Application type :
Standard  
Application status :
CEASED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Photosensitive resin composition  
Inventor :
Nishikawa, Katsue ; Hagiwara, Youshichi ; Chiba, Reiko ; Kinashi, Keiichi  
Agent name :
Griffith Hack  
Address for service :
GPO Box 1285 MELBOURNE VIC 3001  
Filing date :
30 October 1996  
Associated companies :
 
Applicant name :
National Starch and Chemical Investment Holding Corporation  
Applicant address :
501 Silverside Road Wilmington Delaware 19809 United States Of America  
Old name :
 
Original Source :
Go  

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