Details
- Application number :
- 2002325340
- Application type :
- Standard
- Application status :
- LAPSED
- Under opposition :
- No
- Proceeding type :
-
- Invention title :
- Photosensitive resin composition
- Inventor :
- Oka, Hidetaka
;
Ohwa, Masaki
;
Kura, Hisatoshi
- Agent name :
-
- Address for service :
-
- Filing date :
- 18 July 2002
- Associated companies :
-
- Applicant name :
- CIBA SPECIALTY CHEMICALS HOLDING INC.
- Applicant address :
- Klybeckstrasse 141, CH-4057 Basle
- Old name :
-
- Original Source :
- Go
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