Composition and method for cvd deposition of zr/hf silicate films
A Standard patent application filed on 02 October 2000 credited to Paw, Witold ; Baum, Thomas H.

Details

Application number :
78477  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Composition and method for cvd deposition of zr/hf silicate films  
Inventor :
Paw, Witold ; Baum, Thomas H.  
Agent name :
 
Address for service :
 
Filing date :
02 October 2000  
Associated companies :
 
Applicant name :
Advanced Technology Materials, Inc.  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor