Tetrahyrofuran-adducted group ii beta-diketonate complexes as source reagents for chemical vapor deposition
A Standard patent application filed on 08 May 2000 credited to Paw, Witold ; Baum, Thomas H.

Details

Application number :
48287  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Tetrahyrofuran-adducted group ii beta-diketonate complexes as source reagents for chemical vapor deposition  
Inventor :
Paw, Witold ; Baum, Thomas H.  
Agent name :
 
Address for service :
 
Filing date :
08 May 2000  
Associated companies :
 
Applicant name :
Advanced Technology Materials, Inc.  
Applicant address :
 
Old name :
 
Original Source :
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Same Inventor