Polishing pads and planarizing machines for mechanical and/or chemical-mechanical planarization of microelectronic substrate assemblies
A Standard patent application filed on 30 August 2000 credited to Chopra, Dinesh

Details

Application number :
73458  
Application type :
Standard  
Application status :
LAPSED  
Under opposition :
No  
Proceeding type :
 
Invention title :
Polishing pads and planarizing machines for mechanical and/or chemical-mechanical planarization of microelectronic substrate assemblies  
Inventor :
Chopra, Dinesh  
Agent name :
 
Address for service :
 
Filing date :
30 August 2000  
Associated companies :
 
Applicant name :
Micron Technology, Inc.  
Applicant address :
 
Old name :
 
Original Source :
Go  

Same Inventor